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Equipment for temperature measurements of e-beam lithograph.

Student: Petr Stanek

Supervisor: Mgr. Frantisek Matejka

   This technical project deals with problems concerning temperature measurements of selected parts of an e-beam lithograph. The main goal is a design and a practical realization of a temperature measurement circuitry. The circuit is based on a processor-controlled multiplexer (six thermocouple-measured points at the same time) and a METEX multimeter connected to a PC through a serial port. The measurement equipments will be used for temperature drift mapping of selected parts of an e-beam lithograph, which plays an important role in the production cycle and the eventual further thermo stabilisation.




EBL Lab ISI Brno Last change:12.6.2000 VK