Data preprocessing of large-sized e-beam expositions.
Student: Richard Gavenda
Supervisor: Ing. Vladimir Kolarik, PhD.
Large size e-beam lithographic expositions are to be divided into subsequent expositions which size is limited by the basic exposition field. Two basic goals were looking for. First, an original structure is to be split into required-sized substructures giving them predefined names. Second, a sequency of separate substructure expositions is to be generated which is compatible with a given exposition language. A Delphi program was written to achieve these goals. Its correctness was confirmed on several expositions.
Figures: The structure splitting window (top), the sequency generator window (bottom).
