Abstract   ---    Optical samples   ---    E-beam samples   ---    Description   ---    Details (in Czech)

Dimension Standards for Electron and Optical Microscopy
prepared by Electron-Beam Lithography

  • Grid (3-100um) and geometric shape (rectangles, circles, scales) standards were prepared using electron-beam lithography. A high precision of the standards is due to a laser-interferometer based calibration of the exposition field. Samples were prepared for the optical microscopy (thin-film metal on glass substrate) as well as for the electrone-beam microscopy (e.g. anisotropic etching of Silicon). Required geometry and size can by designed according to specific user requirements.
  • Detailed information: a poster at Transfer'99 conference (in Czech) or upon request (Matejka, Kolarik)