Elimination of the proximity effect in multilevel diffractive structures
MSc. student: Lukáš Daněk
This diploma work deals with the creation of multilevel diffractive structures using electron-beam lithography. It is focused on the phenomenon known as "Proximity effect", which makes the exact realisation of the submicron diffraction relief impossible. A method for evaluating predispositions of source data of a diffractive relief to the proximity effect is proposed and an algorithm for elimination of the proximity effect is developed.
Figures: Detailed view of a prepared relief CGH structure.
