| Title: | Improvement of Electron-Beam Lithograph |
| Funded by: | Grant Agency of the Czech Republic - GACR |
| Reference: | GACR 102/97/1145 |
| Years: | 1997-1998 |
| Total Budget: | 674 kKc |
| Abstract: | The aim of the project is the development of an instrument for research and prototype production of micro-elements. Actual electron beam lithograph could be useful for the above purposes. The basic part of the lithograph provides correct operation, however the electronic control part needs an improvement due to new requests in the area of data pre-processing and function stability. |
| Publication: | F. Matejka, V. Kolarik, New Ways in Electron-Beam Lithography, Proc. of the 5th Electronic Devices and Systems Conference, Brno, 11.-12.6. 1998. |
| Related Publications: | F. Matejka, V. Kolarik,
Mikrolitografie struktur pro senzoriku a prvky MEMS a OVS,
Proc. of the Transfer 98, Prague, 8.-10.6. 1998, pp. 171-2, (in Czech). P. Misik, J Vasina, Novy datovy system pro expozici submikronovych struktur, Proc. of the Transfer 98, Prague, 8.-10.6. 1998, pp. 141-2, (in Czech). T. Tethal, Z. Ryzi, I. Rychter, Synteticke difrakcni opticke prvky generovane elektronovym litografem, Proc. of the Transfer 98, Prague, 8.-10.6. 1998, pp. 159-60, (in Czech). F. Matejka, V. Kolarik, Metrické normály pro optickou a elektronovou mikroskopii připravené pomocí elektronového litografu, Proc. of the Transfer 99, Brno, 8.-9.6. 1999, pp. C21-22, (in Czech). |